Instruments

MBE-2300 PLD system

PLD System (MBE-2300)

Laser
Excimer / Nd:YAG
Wavelength
248 / 355 / 532 nm
Fluence
0.5–3 J·cm⁻²
Repetition rate
1–20 Hz
Base pressure
< 5×10⁻⁶ mbar
Process gases
O₂, Ar, N₂ (MFC)
Substrate heating
RT–800 °C
Targets
Ø1″–2″, 6-position carousel
Custom PLD and laser optics bench

CVD Lab (Gas, Optics and Plasma diagnostics)

  • Modular chamber, adjustable target–substrate spacing
  • Parameter sweeps (fluence, pO₂, spacing)
  • Combinatorial deposition support
  • Flexible optics & diagnostics for process development

Electrical Metrology

Four-point probe (sheet resistance) setup

Sheet Resistance — Four-Point Probe

Non-destructive sheet resistance measurement using 4-probe geometry to minimise contact resistance effects. Suitable for conductive/semiconductive films.

Other Characterisation

We collaborate with partner facilities for additional measurements when required.

Diagnostics

Andor Mechelle — plasma spectroscopy

Plasma Spectroscopy — Andor Mechelle

Time-resolved optical emission spectroscopy for PLD plume analysis: track plume dynamics, identify emission lines, and tune laser/process parameters for film quality.

  • Plume composition & excitation monitoring
  • Process optimisation (fluence, pO₂, target–substrate spacing)
  • Alignment/diagnostics support for custom PLD

Typical Outputs

Emission spectra vs. time/wavelength for plume species; qualitative trends for energy coupling and stoichiometric transfer. Bring/attach your target list of lines for quick checks.